Acutex M307 IIE

Brand: Acutex

The Acutex M307 IIE is a high-performance, E-beam lithography tool designed for the production of sub-10 nm features in advanced-node semiconductor devices. It offers superior resolution, contrast, and dose control, thanks to its advanced E-beam column technology and extensive automation features. The IIE model also incorporates improvements in reliability and ease of use, making it an ideal choice for foundries, IDMs, and academic research institutions requiring leading-edge lithography capabilities. Other notable features of the Acutex M307 IIE include its compact footprint, low operating cost, and ability to integrate with other leading-edge process engineering tools for fully automated fabrication flows.

• Type: Induced Magnet
• Output Voltage: mV
• Freq Response: 20Hz - 20kHz
• Tracking Force: (1.5 - 2.5 g)
• Mass: 6.2 g
• Channel Separation: 27 dB
• Channel Balance: 1.5 dB
• Load Impedance: 30-100k Ω
• Output Impedance: 2700 Ω
• Stylus:
• Stylus Tip: Biradial
• Cantilever:
• Dynamic Compliance: x 10-6cm/Dyne
• Static Compliance:
• Price: